ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,421, issued on May 19, was assigned to TEXAS INSTRUMENTS Inc. (Dallas). "Method of forming a hall sensor with performance control" was inven... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,422, issued on May 19, was assigned to American Superconductor Corp. (Ayer, Mass.). "Electro-formed metal foils" was invented by Cornelis Le... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,423, issued on May 19, was assigned to United States of America as represented by the Secretary of the Navy (Washington). "Heat dissipation ... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,424, issued on May 19, was assigned to NEC Corp. (Tokyo). "Quantum device" was invented by Kunihiko Ishihara (Tokyo), Suguru Watanabe (Tokyo... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,425, issued on May 19, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Stacked conductive bridge random access memory... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,426, issued on May 19, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.). "Resistive random-access memory device with ste... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,427, issued on May 19, was assigned to SUMCO Corp. (Tokyo). "Flat epitaxial wafer having minimal thickness variation" was invented by Naoyuk... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,428, issued on May 19, was assigned to Microsoft Technology Licensing LLC (Redmond, Wash.). "Shadow walls for use in fabricating devices" wa... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,429, issued on May 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods of depositing SiCON with C, O, and N compositi... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,430, issued on May 19, was assigned to Hitachi High-Tech Corp. (Tokyo). "Plasma processing method" was invented by Miyako Matsui (Tokyo) and... Read More